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Remarkably enhanced plasma resistance of Y2O3-and Y-rich thin films through controllable reactive sputtering
Year 2025
Journal Appl. Surf. Sci.
Author Hae-Seong Jang, Kang-Bin Bae, Se-Rin Min, Yoon-Suk Oh, In-Hwan Lee*, Sung-Min Lee

IF: 6.3 (JCR Top 10.9%)

https://doi.org/10.1016/j.apsusc.2024.162050

Publication date: 15 Mar 2025